A low-temperature route for producing epitaxial perovskite superlattice structures on (001)-oriented SrTiO3/Si substrates

Abstract

We report on the formation of epitaxial perovskite oxide superlattice structures by atomic layer deposition (ALD), which are integrated monolithically on Si wafers using a template layer of SrTiO3 deposited by hybrid molecular beam epitaxy.

Document Details

Document Type
Pub Defense Publication
Publication Date
Jan 01, 2021
Source ID
10.1039/d1tc01988k

Entities

People

  • Aleksandr V. Plokhikh
  • Alexander L. Vasiliev
  • Igor A. Karateev
  • Jason Lapano
  • Jonathan E Spanier
  • Matthias Falmbigl
  • Roman Engel-herbert
  • И. С. Головина

Organizations

  • Division of Materials Research
  • Drexel University
  • Moscow Institute of Physics and Technology
  • National Research Centre Kurchatov Institute
  • Office of Naval Research
  • Pennsylvania State University
  • United States Army Research Laboratory

Tags

Fields of Study

  • Materials science

Readers

  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.
  • Thin Film Deposition Science.