Chlorine-mediated atomic layer deposition of HfO2 on graphene
Abstract
The ALD process of deposition of ultrathin high-κ HfO2 on chlorinate graphene.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jan 01, 2021
- Source ID
- 10.1039/d1tc03502a
Entities
People
- Chinedu Ekuma
- James C. Hone
- Katherine M. Price
- Madan Dubey
- Matt L. Chin
- Peter M. Wilson
- Sina Najmaei
- Theanne Schiros
Organizations
- Columbia University
- Fashion Institute of Technology
- Lehigh University
- National Science Foundation
- United States Army Research Laboratory