Mapping complex profiles of light intensity with interferometric lithography
Abstract
Complex light intensity patterns formed by closely-spaced multiple apertures in a metal film can be faithfully mapped with sub-wavelength resolution, from near-field to far-field, by interferometric lithography.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jan 01, 2023
- Source ID
- 10.1039/d2na00570k
Entities
People
- Bogdan Dragnea
- Joseph Holmes
- Mi Zhang
- Stephen C Jacobson
- Tine Greibe
- William L. Schaich
Organizations
- Army Research Office
- Indiana University
- National Institutes of Health
- National Science Foundation