Patterning submicron photomechanical features into single diarylethene crystals using electron beam lithography
Abstract
Electron beam lithography is used to pattern sub-micron structures into photomechanical organic single crystals. The patterned features exhibit up to 70% height changes when the bulk crystal undergoes reversible photoisomerization.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jan 01, 2022
- Source ID
- 10.1039/d2nh00205a
Entities
People
- Christopher J Bardeen
- Daichi Kitagawa
- Elena Bekyarova
- Seiya Kobatake
- Wangxiang Li
Organizations
- Office of Naval Research
- Osaka City University
- University of California, Riverside