Step bunching-induced vertical lattice mismatch and crystallographic tilt in vicinal BiFeO3(001) films

Abstract

Epitaxial (001) BiFeO3 thin films grown on vicinal SrTiO3 substrates are under large anisotropic stress from the substrates. The variations of the crystallographic tilt angle and the c lattice constant, caused by the lattice mismatch, along the film thickness were analyzed quantitatively using the x-ray diffraction technique. By generalizing the Nagai model, we estimated how step bunching resulted in the vertical lattice mismatch between adjacent BiFeO3 layers, which induced the strain relaxation and crystallographic tilt. The step bunching was confirmed by the increased terrace width on the BiFeO3 surface.

Document Details

Document Type
Pub Defense Publication
Publication Date
Jan 10, 2011
Source ID
10.1063/1.3535981

Entities

People

  • C. B. Eom
  • J.-g. Yoon
  • J.-s. Chung
  • S. H. Baek
  • S. H. Chang
  • S. M. Yang
  • S. Y. Jang
  • T. H. Kim
  • T. K. Song
  • T. W. Noh

Organizations

  • Army Research Office
  • Changwon National University
  • Seoul National University
  • Soongsil University
  • University of Suwon
  • University of Wisconsin–Madison

Tags

Fields of Study

  • Materials science

Readers

  • Electronics Engineering
  • Materials Science and Engineering.
  • Nanofabrication and Microfabrication.