Electronic structure analysis of threading screw dislocations in 4H–SiC using electron holography

Abstract

Off-axis electron holography has been used to map the electrostatic potential distribution of threading screw dislocations in differently n-doped 4H–SiC epitaxial layers. Observed phase contrast indicated the presence of a negatively charged dislocation core. Comparison between experimental and simulated potential profiles indicated that the density of trapped charges increased for a higher doped epilayer. Assuming a single level of the trap at the core, the ionization energy of the trap was calculated to be 0.89±0.22 eV.

Document Details

Document Type
Pub Defense Publication
Publication Date
Feb 01, 2011
Source ID
10.1063/1.3544066

Entities

People

  • Marek Skowronski
  • Martha R. Mccartney
  • Ronen A. Berechman
  • Suk Chung

Organizations

  • Arizona State University
  • Carnegie Mellon University
  • Office of Naval Research

Tags

Fields of Study

  • Materials science

Readers

  • Image Processing and Computer Vision.
  • Materials Science and Engineering.
  • Semiconductor Device Technology

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene