Third harmonic generation at 223 nm in the metallic regime of GaP

Abstract

We demonstrate second and third harmonic generation from a GaP substrate 500 μm thick. The second harmonic field is tuned at the absorption resonance at 335 nm, and the third harmonic signal is tuned at 223 nm, in a range where the dielectric function is negative. These results show that a phase locking mechanism that triggers transparency at the harmonic wavelengths persists regardless of the dispersive properties of the medium, and that the fields propagate hundreds of microns without being absorbed even when the harmonics are tuned to portions of the spectrum that display metallic behavior.

Document Details

Document Type
Pub Defense Publication
Publication Date
Mar 14, 2011
Source ID
10.1063/1.3565240

Entities

People

  • J. V. Foreman
  • M. A. Vincenti
  • M. Scalora
  • N. Aközbek
  • V. Roppo

Organizations

  • Army Research Office
  • Polytechnic University of Catalonia
  • United States Army Combat Capabilities Development Command

Tags

Fields of Study

  • Physics

Readers

  • Electronics Engineering
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