Size tunable visible and near-infrared photoluminescence from vertically etched silicon quantum dots

Abstract

Corrugated etching techniques were used to fabricate size-tunable silicon quantum dots that luminesce under photoexcitation, tunable over the visible and near infrared. By using the fidelity of lithographic patterning and strain limited, self-terminating oxidation, uniform arrays of pillar containing stacked quantum dots as small as 2 nm were patterned. Furthermore, an array of pillars, with multiple similar sized quantum dots on each pillar, was fabricated and tested. The photoluminescence displayed a multiple, closely peaked emission spectra corresponding to quantum dots with a narrow size distribution. Similar structures can provide quantum confinement effects for future nanophotonic and nanoelectronic devices.

Document Details

Document Type
Pub Defense Publication
Publication Date
Apr 11, 2011
Source ID
10.1063/1.3580768

Entities

People

  • Andrew P. Homyk
  • Axel Scherer
  • Carrie E. Hofmann
  • Claudia Shin
  • Harry Atwater
  • M. David Henry
  • Sameer S. Walavalkar

Organizations

  • California Institute of Technology
  • Defense Advanced Research Projects Agency

Tags

Readers

  • Materials Science and Engineering.
  • Nanofabrication and Microfabrication.
  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.

Technology Areas

  • Quantum Computing