A new route to graphene layers by selective laser ablation

Abstract

Selectively creating regions of spatially varying thickness may enable the utilization of the electronic properties of N-layer (N=1 or more) graphene and other similar layered materials (e.g., topological insulators or layered superconductors) for novel devices and functionalities on a single chip. The ablation threshold energy density increases dramatically for decreasing layer numbers of graphene originating from the dimensional crossover of the specific heat. For the 2D regime of graphite (up to N≈7) the dominant flexural mode specific heat (due to its N-1 dependence) gives rise to a strong layer number-dependence on the pulsed laser ablation threshold energy density, while for 3D regime (N>>7) the ablation threshold saturates due to dominant acoustic mode specific heat. As a result, several energy density windows exist between the minimum energy densities that are required for ablating single, bi, or more layers of graphene, allowing layer number selectivity.

Document Details

Document Type
Pub Defense Publication
Publication Date
Apr 20, 2011
Source ID
10.1063/1.3584204

Entities

People

  • A. H. Castro Neto
  • A. Roy Barman
  • A. Rusydi
  • Ariando
  • B. Őzyilmaz
  • G. X. Ni
  • K. P. Loh
  • M. Rubhausen
  • S. Tripathy
  • Shilpa S. Dhar
  • T. Venkatesan
  • X. F. Xu
  • Xufeng Wang
  • Yuan Zheng

Organizations

  • Boston University
  • National University of Singapore
  • Office of Naval Research
  • University of Hamburg

Tags

Fields of Study

  • Physics

Readers

  • Fluid Dynamics.
  • Nanoscale Plasmonic Nanotechnology
  • Pulsed Power and Plasma Physics.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene