Observation of boron diffusion in an annealed Ta/CoFeB/MgO magnetic tunnel junction with standing-wave hard x-ray photoemission

Abstract

The CoFeB/MgO system shows promise as a magnetic tunnel junction with perpendicular magnetization and low critical current densities for spin-torque driven magnetization switching. The distribution of B after annealing is believed to be critical to performance. We have studied the distribution of B in a Ta/Co0.2Fe0.6B0.2/MgO sample annealed at 300 °C for 1 h with standing-wave hard x-ray photoemission spectroscopy (SW-HXPS). Comparing experimental rocking curve data to x-ray optical calculations indicates diffusion of 19.5% of the B uniformly into the MgO and of 23.5% into a thin TaB interface layer. SW-HXPS is effective for probing depth distributions in such spintronic structures.

Document Details

Document Type
Pub Defense Publication
Publication Date
Nov 12, 2012
Source ID
10.1063/1.4766351

Entities

People

  • A. A. Greer
  • A. M. Kaiser
  • A. X. Gray
  • C. Bordel
  • C. M. Schneider
  • C. S. Fadley
  • F. Hellman
  • F. Matsukura
  • G. Palsson
  • Galen Conti
  • H. Ohno
  • J. B. Kortright
  • K. Kobayashi
  • N. Maejima
  • S. Ikeda
  • S. Ueda
  • S.-h. Yang
  • Shun Kanai
  • Yohachi Yamashita

Organizations

  • Army Research Office
  • International Business Machines Corporation (Armonk, NY)
  • Lawrence Berkeley National Laboratory
  • Nara Institute of Science and Technology
  • Stanford University
  • Tohoku University
  • United States Department of Energy
  • University of California
  • University of Rouen-Normandy

Tags

Fields of Study

  • Physics

Readers

  • Quantum spin resonance or Electron Paramagnetic Resonance spectroscopy.
  • Semiconductor Device Technology
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene