Near-field infrared absorption of plasmonic semiconductor microparticles studied using atomic force microscope infrared spectroscopy

Abstract

We report measurements of near-field absorption in heavily silicon-doped indium arsenide microparticles using atomic force microscope infrared spectroscopy (AFM-IR). The microparticles exhibit an infrared absorption peak at 5.75 μm, which corresponds to a localized surface plasmon resonance within the microparticles. The near-field absorption measurements agree with far-field measurements of transmission and reflection, and with results of numerical solutions of Maxwell equations. AFM-IR measurements of a single microparticle show the temperature increase expected from Ohmic heating within the particle, highlighting the potential for high resolution infrared imaging of plasmonic and metamaterial structures.

Document Details

Document Type
Pub Defense Publication
Publication Date
Apr 15, 2013
Source ID
10.1063/1.4802211

Entities

People

  • Christopher M. Roberts
  • Daniel M. Wasserman
  • Jonathan R. Felts
  • Stephanie Law
  • Viktor Podolskiy
  • William P King

Organizations

  • Air Force Office of Scientific Research
  • National Science Foundation
  • Office of Science
  • University of Illinois Urbana–Champaign
  • University of Massachusetts Lowell

Tags

Fields of Study

  • Physics

Readers

  • Aerosol Science/Aerosol Physics
  • Nanoscale Plasmonic Nanotechnology
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene