Imprinting of fine-scale magnetic patterns in electroplated hard magnetic films using magnetic foil masks

Abstract

This paper presents a batch-fabrication approach to imprint complex magnetic pole patterns (perpendicular north/south poles) into hard magnetic films using fine-scale, laser-machined iron foil “masks.” In this approach, pulsed magnetic fields varying between 0.1 and 1.0 T are used in conjunction with the field-concentrating effect of the iron foil masks to selectively reverse the magnetization of selected regions of 10-μm-thick Co80Pt20 films (Br = 1 T, Hci = 340 kA/m). Simple stripe array patterns are systematically studied both experimentally and via simulation, achieving patterned feature sizes (poles) down to 30 μm. Double exposures are also explored to create checkerboard patterns from simple stripe-like masks. Finally, masks with more complex patterns are used to demonstrate the viability of the approach to imprint arbitrary features.

Document Details

Document Type
Pub Defense Publication
Publication Date
Feb 06, 2014
Source ID
10.1063/1.4864145

Entities

People

  • Alexandra Garraud
  • David P Arnold
  • Ololade D. Oniku
  • Paul V. Ryiz

Organizations

  • Defense Advanced Research Projects Agency
  • University of Florida

Tags

Fields of Study

  • Physics

Readers

  • Superconducting Magnet Technology
  • Thin Film Deposition Science.
  • Vision Science/Vision Psychology/Cognitive Neuroscience.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition