Fabrication of highly spin-polarized Co2FeAl0.5Si0.5 thin-films

Abstract

Ferromagnetic Heusler Co2FeAl0.5Si0.5 epitaxial thin-films have been fabricated in the L21 structure with saturation magnetizations over 1200 emu/cm3. Andreev reflection measurements show that the spin polarization is as high as 80% in samples sputtered on unheated MgO (100) substrates and annealed at high temperatures. However, the spin polarization is considerably smaller in samples deposited on heated substrates.

Document Details

Document Type
Pub Defense Publication
Publication Date
Apr 01, 2014
Source ID
10.1063/1.4869798

Entities

People

  • C. Youngbull
  • J. A. Gifford
  • L. Yu
  • M. Vahidi
  • Mingxiong Huang
  • N. Newman
  • S. K. Zhang
  • Siddhartha Krishnamurthy
  • Timothy Y. Chen
  • Zhi-Gang

Organizations

  • Arizona State University
  • Office of Naval Research
  • SRI International

Tags

Fields of Study

  • Materials science
  • Physics

Readers

  • Quantum spin resonance or Electron Paramagnetic Resonance spectroscopy.
  • Superconducting Magnet Technology
  • Thin Film Deposition Science.