Inelastic electron tunneling spectroscopy of local “spin accumulation” devices

Abstract

We investigate the origin of purported “spin accumulation” signals observed in local “three-terminal” (3T) measurements of ferromagnet/insulator/n-Si tunnel junctions using inelastic electron tunneling spectroscopy (IETS). Voltage bias and magnetic field dependences of the IET spectra were found to account for the dominant contribution to 3T magnetoresistance, thus indicating that it arises from inelastic tunneling through impurities and defects at junction interfaces and within the barrier, rather than from spin accumulation due to pure elastic tunneling into bulk Si as has been previously assumed.

Document Details

Document Type
Pub Defense Publication
Publication Date
Jun 09, 2014
Source ID
10.1063/1.4883638

Entities

People

  • Holly N. Tinkey
  • Ian Appelbaum
  • Pengke Li

Organizations

  • Office of Naval Research
  • University of Maryland

Tags

Fields of Study

  • Physics

Readers

  • Semiconductor Device Technology
  • Structural Dynamics.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics