Atomic and electronic structure of the ferroelectric BaTiO3/Ge(001) interface

Abstract

In this study, we demonstrate the epitaxial growth of BaTiO3 on Ge(001) by molecular beam epitaxy using a thin Zintl template buffer layer. A combination of density functional theory, atomic-resolution electron microscopy and in situ photoemission spectroscopy is used to investigate the electronic properties and atomic structure of the BaTiO3/Ge interface. Aberration-corrected scanning transmission electron micrographs reveal that the Ge(001) 2 × 1 surface reconstruction remains intact during the subsequent BaTiO3 growth, thereby enabling a choice to be made between several theoretically predicted interface structures. The measured valence band offset of 2.7 eV matches well with the theoretical value of 2.5 eV based on the model structure for an in-plane-polarized interface. The agreement between the calculated and measured band offsets, which are highly sensitive to the detailed atomic arrangement, indicates that the most likely BaTiO3/Ge(001) interface structure has been identified.

Document Details

Document Type
Pub Defense Publication
Publication Date
Jun 16, 2014
Source ID
10.1063/1.4883883

Entities

People

  • Agham Posadas
  • Alexander A Demkov
  • David J Smith
  • Kurt D. Fredrickson
  • Martha R. Mccartney
  • Patrick Ponath
  • Toshihiro Aoki

Organizations

  • Air Force Office of Scientific Research
  • Arizona State University
  • University of Texas at Austin

Tags

Fields of Study

  • Materials science

Readers

  • Nanoscale Plasmonic Nanotechnology
  • Quantum Chemistry
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene