Thermal boundary conductance across metal-gallium nitride interfaces from 80 to 450 K

Abstract

Thermal boundary conductance is of critical importance to gallium nitride (GaN)-based device performance. While the GaN-substrate interface has been well studied, insufficient attention has been paid to the metal contacts in the device. In this work, we measure the thermal boundary conductance across interfaces of Au, Al, and Au-Ti contact layers and GaN. We show that in these basic systems, metal-GaN interfaces can impose a thermal resistance similar to that of GaN-substrate interfaces. We also show that these thermal resistances decrease with increasing operating temperature and can be greatly affected by inclusion of a thin adhesion layers.

Document Details

Document Type
Pub Defense Publication
Publication Date
Nov 17, 2014
Source ID
10.1063/1.4902233

Entities

People

  • Brian F. Donovan
  • C.-y. Peter Yang
  • Chester J Szwejkowski
  • Costel Constantin
  • John C. Duda
  • John T. Gaskins
  • Patrick E Hopkins
  • Ramez Cheaito
  • Reese E. Jones

Organizations

  • Air Force Office of Scientific Research
  • James Madison University
  • National Science Foundation
  • Sandia National Laboratories
  • University of Virginia

Tags

Fields of Study

  • Materials science

Readers

  • Semiconductor Device Technology
  • Thermal Physics or Thermal Science.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene