Electrically injected near-infrared light emission from single InN nanowire p-i-n diode

Abstract

We report on the achievement of electroluminescence emission of single InN p-i-n nanowire devices. InN p-i-n nanowire structures were grown directly on Si substrate by plasma-assisted molecular beam epitaxy and subsequently transferred to foreign substrate for the fabrication of single nanowire light emitting diodes. Electroluminescence emission with a peak energy of 0.71 eV (1.75 μm) was observed at 77 K. The measurement of near-bandgap electroluminescence provides unambiguous evidence for the achievement of p-type conduction of InN.

Document Details

Document Type
Pub Defense Publication
Publication Date
Dec 08, 2014
Source ID
10.1063/1.4904271

Entities

People

  • Binh Huy Le
  • Nhung Hong Tran
  • Songrui Zhao
  • Zetian Mi

Organizations

  • Army Research Office
  • McGill University
  • Natural Sciences and Engineering Research Council

Tags

Fields of Study

  • Materials science

Readers

  • Nanoscale Plasmonic Nanotechnology
  • Semiconductor Device Technology