Theory of resonant tunneling in bilayer-graphene/hexagonal-boron-nitride heterostructures

Abstract

A theory is developed for calculating vertical tunneling current between two sheets of bilayer graphene separated by a thin, insulating layer of hexagonal boron nitride, neglecting many-body effects. Results are presented using physical parameters that enable comparison of the theory with recently reported experimental results. Observed resonant tunneling and negative differential resistance in the current–voltage characteristics are explained in terms of the electrostatically-induced band gap, gate voltage modulation, density of states near the band edge, and resonances with the upper sub-band. These observations are compared to ones from similar heterostructures formed with monolayer graphene.

Document Details

Document Type
Pub Defense Publication
Publication Date
Mar 02, 2015
Source ID
10.1063/1.4914324

Entities

People

  • Randall M. Feenstra
  • Sergio C. De La Barrera

Organizations

  • Carnegie Mellon University
  • Defense Advanced Research Projects Agency
  • Semiconductor Research Corporation

Tags

Fields of Study

  • Physics

Readers

  • Calculus or Mathematical Analysis
  • Quantum spin resonance or Electron Paramagnetic Resonance spectroscopy.
  • Semiconductor Device Technology

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene