Plasmonics in strained monolayer black phosphorus
Abstract
Monolayer black phosphorus (BP) has high band anisotropy which can be modulated with strain. We show that the plasmonic dispersions in monolayer BPs not only strongly depend on the crystalline direction but also strain. Application of strain can alter the optimum direction for plasmon transport and engineer the anisotropic plasmonic dispersion relations. Furthermore, we evaluate the plasmon losses and wave localization via the random-phase approximation framework. It is found that although the BP monolayer is inferior to graphene in terms of loss at the same wave localization, it outperforms monolayer MoS2. The dependence of plasmon properties on the applied strain in BP makes it an interesting nanophotonic material, as well as a potential medium for piezo-optic applications.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Mar 18, 2015
- Source ID
- 10.1063/1.4914536
Entities
People
- Jing Guo
- Kai-tak Lam
Organizations
- National Science Foundation
- Office of Naval Research
- University of Florida