Effect of secondary electron emission on the plasma sheath

Abstract

In this experiment, plasma sheath potential profiles are measured over boron nitride walls in argon plasma and the effect of secondary electron emission is observed. Results are compared to a kinetic model. Plasmas are generated with a number density of 3 × 1012 m−3 at a pressure of 10−4 Torr-Ar, with a 1%–16% fraction of energetic primary electrons. The sheath potential profile at the surface of each sample is measured with emissive probes. The electron number densities and temperatures are measured in the bulk plasma with a planar Langmuir probe. The plasma is non-Maxwellian, with isotropic and directed energetic electron populations from 50 to 200 eV and hot and cold Maxwellian populations from 3.6 to 6.4 eV and 0.3 to 1.3 eV, respectively. Plasma Debye lengths range from 4 to 7 mm and the ion-neutral mean free path is 0.8 m. Sheath thicknesses range from 20 to 50 mm, with the smaller thickness occurring near the critical secondary electron emission yield of the wall material. Measured floating potentials are within 16% of model predictions. Measured sheath potential profiles agree with model predictions within 5 V (∼1 Te), and in four out of six cases deviate less than the measurement uncertainty of 1 V.

Document Details

Document Type
Pub Defense Publication
Publication Date
Mar 01, 2015
Source ID
10.1063/1.4914854

Entities

People

  • Mitchell L R Walker
  • S. Langendorf

Organizations

  • Air Force Office of Scientific Research
  • Georgia Tech

Tags

Fields of Study

  • Physics

Readers

  • Plasma Physics.

Technology Areas

  • Microelectronics