Low-loss, submicron chalcogenide integrated photonics with chlorine plasma etching
Abstract
A chlorine plasma etching-based method for the fabrication of high-performance chalcogenide-based integrated photonics on silicon substrates is presented. By optimizing the etching conditions, chlorine plasma is employed to produce extremely low-roughness etched sidewalls on waveguides with minimal penalty to propagation loss. Using this fabrication method, microring resonators with record-high intrinsic Q-factors as high as 450 000 and a corresponding propagation loss as low as 0.42 dB/cm are demonstrated in submicron chalcogenide waveguides. Furthermore, the developed chlorine plasma etching process is utilized to demonstrate fiber-to-waveguide grating couplers in chalcogenide photonics with high power coupling efficiency of 37% for transverse-electric polarized modes.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Mar 16, 2015
- Source ID
- 10.1063/1.4916207
Entities
People
- Ashutosh Rao
- Jeff Chiles
- Kathleen Richardson
- Marcin Malinowski
- Sasan Fathpour
- Spencer Novak
Organizations
- Clemson University
- Defense Threat Reduction Agency
- National Science Foundation
- Office of Naval Research
- University of Central Florida