Movement of basal plane dislocations in GaN during electron beam irradiation

Abstract

The movement of basal plane segments of dislocations in low-dislocation-density GaN films grown by epitaxial lateral overgrowth as a result of irradiation with the probing beam of a scanning electron microscope was detected by means of electron beam induced current. Only a small fraction of the basal plane dislocations was susceptible to such changes and the movement was limited to relatively short distances. The effect is explained by the radiation enhanced dislocation glide for dislocations pinned by two different types of pinning sites: a low-activation-energy site and a high-activation-energy site. Only dislocation segments pinned by the former sites can be moved by irradiation and only until they meet the latter pinning sites.

Document Details

Document Type
Pub Defense Publication
Publication Date
Mar 30, 2015
Source ID
10.1063/1.4916632

Entities

People

  • A. Y. Polyakov
  • E. B. Yakimov
  • In-hwan Lee
  • P. S. Vergeles
  • S. J. Pearton

Organizations

  • Defense Threat Reduction Agency
  • Jeonbuk National University
  • Ministry of Education and Science of the Russian Federation
  • National University of Science and Technology
  • Russian Academy of Sciences
  • University of Florida

Tags

Readers

  • Materials Science and Engineering.
  • Semiconductor Device Technology

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics