Ultra-thin distributed Bragg reflectors via stacked single-crystal silicon nanomembranes
Abstract
In this paper, we report ultra-thin distributed Bragg reflectors (DBRs) via stacked single-crystal silicon (Si) nanomembranes (NMs). Mesh hole-free single-crystal Si NMs were released from a Si-on-insulator substrate and transferred to quartz and Si substrates. Thermal oxidation was applied to the transferred Si NM to form high-quality SiO2 and thus a Si/SiO2 pair with uniform and precisely controlled thicknesses. The Si/SiO2 layers, as smooth as epitaxial grown layers, minimize scattering loss at the interface and in between the layers. As a result, a reflection of 99.8% at the wavelength range from 1350 nm to 1650 nm can be measured from a 2.5-pair DBR on a quartz substrate and 3-pair DBR on a Si substrate with thickness of 0.87 μm and 1.14 μm, respectively. The high reflection, ultra-thin DBRs developed here, which can be applied to almost any devices and materials, holds potential for application in high performance optoelectronic devices and photonics applications.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- May 04, 2015
- Source ID
- 10.1063/1.4921055
Entities
People
- Deyin Zhao
- Hongyi Mi
- Jaeseong Lee
- Jung-Hun Seo
- Minkyu Cho
- Munho Kim
- Weidong Zhou
- Xin Yin
- Xudong Wang
- Zhenqiang Ma
Organizations
- Air Force Office of Scientific Research
- University of Texas at Arlington
- University of Wisconsin–Madison