Oxide 2D electron gases as a route for high carrier densities on (001) Si
Abstract
Two dimensional electron gases (2DEGs) formed at the interfaces of oxide heterostructures draw considerable interest owing to their unique physics and potential applications. Growing such heterostructures on conventional semiconductors has the potential to integrate their functionality with semiconductor device technology. We demonstrate 2DEGs on a conventional semiconductor by growing GdTiO3-SrTiO3 on silicon. Structural analysis confirms the epitaxial growth of heterostructures with abrupt interfaces and a high degree of crystallinity. Transport measurements show the conduction to be an interface effect, ∼9 × 1013 cm−2 electrons per interface. Good agreement is demonstrated between the electronic behavior of structures grown on Si and on an oxide substrate, validating the robustness of this approach to bridge between lab-scale samples to a scalable, technologically relevant materials system.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- May 18, 2015
- Source ID
- 10.1063/1.4921437
Entities
People
- Alexis T. Ernst
- Charles Ahn
- Christine C. Broadbridge
- D. Kumah
- Eric N Jin
- Fred J. Walker
- Lior Kornblum
Organizations
- National Science Foundation
- Office of Naval Research
- Southern Connecticut State University
- Yale University