Dielectric response of metal/SrTiO3/two-dimensional electron liquid heterostructures

Abstract

Maximizing the effective dielectric constant of the gate dielectric stack is important for electrostatically controlling high carrier densities inherent to strongly correlated materials. SrTiO3 is uniquely suited for this purpose, given its extremely high dielectric constant, which can reach 104. Here, we present a systematic study of the thickness dependence of the dielectric response and leakage of SrTiO3 that is incorporated into a vertical structure on a high-carrier-density two-dimensional electron liquid (2DEL). A simple model can be used to interpret the data. The results show a need for improved interface control in the design of metal/SrTiO3/2DEL devices.

Document Details

Document Type
Pub Defense Publication
Publication Date
Aug 17, 2015
Source ID
10.1063/1.4928751

Entities

People

  • Evgeny Mikheev
  • Santosh Raghavan
  • Susanne Stemmer

Organizations

  • National Science Foundation
  • Office of Naval Research
  • University of California

Tags

Readers

  • Nanofabrication and Microfabrication.
  • Semiconductor Device Technology
  • Systems Analysis and Design

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene