Method for determining the residual electron- and hole-densities about the neutrality point over the gate-controlled n ↔ p transition in graphene

Abstract

The Hall effect and the diagonal resistance, which indicates a residual resistivity ρxx≈h/4e2, are experimentally examined over the p ↔ n transition about the nominal neutrality point in chemical vapor deposition (CVD) grown graphene. A distribution of neutrality potentials is invoked in conjunction with multi-carrier conduction to model the experimental observations. From the modeling, we extract the effective residual electron- and hole-densities around the nominal neutrality point. The results indicate mixed transport due to co-existing electrons and holes in large area zero-band gap CVD graphene devices, which indicates domain confined ambipolar currents broadly over the gate-induced n ↔ p transition.

Document Details

Document Type
Pub Defense Publication
Publication Date
Jan 18, 2016
Source ID
10.1063/1.4940363

Entities

People

  • Ramesh G. Mani

Organizations

  • Army Research Office
  • Georgia State University

Tags

Readers

  • Plasma Physics / Magnetohydrodynamics
  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.
  • Semiconductor Device Technology

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene