Single gate p-n junctions in graphene-ferroelectric devices

Abstract

Graphene's linear dispersion relation and the attendant implications for bipolar electronics applications have motivated a range of experimental efforts aimed at producing p-n junctions in graphene. Here we report electrical transport measurements of graphene p-n junctions formed via simple modifications to a PbZr0.2Ti0.8O3 substrate, combined with a self-assembled layer of ambient environmental dopants. We show that the substrate configuration controls the local doping region, and that the p-n junction behavior can be controlled with a single gate. Finally, we show that the ferroelectric substrate induces a hysteresis in the environmental doping which can be utilized to activate and deactivate the doping, yielding an “on-demand” p-n junction in graphene controlled by a single, universal backgate.

Document Details

Document Type
Pub Defense Publication
Publication Date
May 16, 2016
Source ID
10.1063/1.4950975

Entities

People

  • J. Henry Hinnefeld
  • Lane W Martin
  • Moonsub Shim
  • Nadya Mason
  • Ruijuan Xu
  • Shishir Pandya
  • Steven Rogers

Organizations

  • Army Research Office
  • Lawrence Berkeley National Laboratory
  • National Science Foundation
  • University of California
  • University of Illinois Urbana–Champaign

Tags

Fields of Study

  • Physics

Readers

  • Nanocomposite Materials Science
  • Semiconductor Device Technology

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene