Comparison of low frequency charge noise in identically patterned Si/SiO2 and Si/SiGe quantum dots

Abstract

We investigate and compare the charge noise in Si/SiO2 and Si/SiGe gate defined quantum dots with identically patterned gates by measuring the low frequency 1/f current noise through the biased quantum dots in the coulomb blockade regime. The current noise is normalized and used to extract a measurement of the potential energy noise in the system. Additionally, the temperature dependence of this noise is investigated. The measured charge noise in Si/SiO2 compares favorably with that of the SiGe device as well as previous measurements made on other substrates suggesting Si/SiO2 is a potential candidate for spin based quantum computing.

Document Details

Document Type
Pub Defense Publication
Publication Date
Jun 20, 2016
Source ID
10.1063/1.4954700

Entities

People

  • Blake M. Freeman
  • Hong-Wen Jiang
  • Joshua S. Schoenfield

Organizations

  • Army Research Office
  • University of California, Los Angeles

Tags

Fields of Study

  • Physics

Readers

  • Acoustics.
  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.

Technology Areas

  • Quantum Computing
  • Quantum Science - Quantum Dots