Degradation and annealing effects caused by oxygen in AlGaN/GaN high electron mobility transistors
Abstract
Hot-carrier degradation and room-temperature annealing effects are investigated in unpassivated ammonia-rich AlGaN/GaN high electron mobility transistors. Devices exhibit a fast recovery when annealed after hot carrier stress with all pins grounded. The recovered peak transconductance can exceed the original value, an effect that is not observed in control passivated samples. Density functional theory calculations suggest that dehydrogenation of pre-existing ON-H defects in AlGaN plays a significant role in the observed hot carrier degradation, and the resulting bare ON can naturally account for the “super-recovery” in the peak transconductance.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jul 11, 2016
- Source ID
- 10.1063/1.4958706
Entities
People
- D. M. Fleetwood
- E. C. H. Kyle
- En Xia Zhang
- G. X. Duan
- James S. Speck
- Jiayu Chen
- Ronald D. Schrimpf
- Rong Jiang
- S. T. Pantelides
- S. W. Kaun
- Xuhui Shen
Organizations
- Air Force Office of Scientific Research
- Air Force Research Laboratory
- Defense Threat Reduction Agency
- National Science Foundation
- University of California
- University of Memphis
- Vanderbilt University