Defects responsible for lifetime degradation in electron irradiated n-GaN grown by hydride vapor phase epitaxy

Abstract

The effects of room temperature 6 MeV electron irradiation on the donor concentration, deep trap spectra, and diffusion lengths of nonequilibrium charge carriers were studied for undoped n-GaN grown by hydride vapor phase epitaxy. Changes in these parameters begin at a threshold electron fluence of 5 × 1015 cm−2. The diffusion lengths after this fluence decrease by a factor of 3, accompanied by a drastic increase in the density of deep electron traps with the level near Ec – 1 eV. There is a strong correlation between the changes in the density of these traps and the diffusion length of irradiated n-GaN, indicating that these centers control the lifetime in radiation damaged n-GaN. This is in sharp contrast to the starting material, where the lifetimes are controlled by other deep electron traps at Ec – 0.56 eV. The concentration of the latter is not strongly affected by high energy electron irradiation.

Document Details

Document Type
Pub Defense Publication
Publication Date
Mar 13, 2017
Source ID
10.1063/1.4978641

Entities

People

  • A. Y. Polyakov
  • Eugene Yakimov
  • I. V. Shchemerov
  • In-hwan Lee
  • K. I. Tapero
  • N. B. Smirnov
  • R. A. Zinovyev
  • S. I. Didenko
  • Stephen Pearton
  • С. А. Тарелкин

Organizations

  • Defense Threat Reduction Agency
  • Jeonbuk National University
  • Ministry of Education and Science of the Russian Federation
  • National Research Foundation of Korea
  • National University of Science and Technology
  • Russian Academy of Sciences
  • University of Florida

Tags

Fields of Study

  • Materials science

Readers

  • Pulsed Power and Plasma Physics.
  • Semiconductor Device Technology

Technology Areas

  • Microelectronics