Probing carbon impurities in hexagonal boron nitride epilayers

Abstract

Carbon doped hexagonal boron nitride epilayers have been grown by metal organic chemical vapor deposition. Photocurrent excitation spectroscopy has been utilized to probe the energy levels associated with carbon impurities in hexagonal boron nitride (h-BN). The observed transition peaks in photocurrent excitation spectra correspond well to the energy positions of the bandgap, substitutional donors (CB, carbon impurities occupying boron sites), and substitutional acceptors (CN, carbon impurities occupying nitrogen sites). From the observed transition peak positions, the derived energy level of CB donors in h-BN is ED ∼ 0.45 eV, which agrees well with the value deduced from the temperature dependent electrical resistivity. The present study further confirms that the room temperature bandgap of h-BN is about 6.42–6.45 eV, and the CN deep acceptors have an energy level of about 2.2–2.3 eV. The results also infer that carbon doping introduces both shallow donors (CB) and deep acceptors (CN) via self-compensation, and the energy level of carbon donors appears to be too deep to enable carbon as a viable candidate as an n-type dopant in h-BN epilayers.

Document Details

Document Type
Pub Defense Publication
Publication Date
May 01, 2017
Source ID
10.1063/1.4982647

Entities

People

  • Hongxing Jiang
  • Jing Li
  • Jingyu Lin
  • M. R. Uddin

Organizations

  • Army Research Office
  • Texas Tech University
  • United States Department of Energy

Tags

Fields of Study

  • Materials science

Readers

  • Materials Science and Engineering.
  • Reinforced Composite Materials
  • Semiconductor Device Technology

Technology Areas

  • AI & ML