Tunnel-injected sub 290 nm ultra-violet light emitting diodes with 2.8% external quantum efficiency

Abstract

We report on the high efficiency tunnel-injected ultraviolet light emitting diodes (UV LEDs) emitting at 287 nm. Deep UV LED performance has been limited by the severe internal light absorption in the p-type contact layers and low electrical injection efficiency due to poor p-type conduction. In this work, a polarization engineered Al0.65Ga0.35N/In0.2Ga0.8N tunnel junction layer is adopted for non-equilibrium hole injection to replace the conventionally used direct p-type contact. A reverse-graded AlGaN contact layer is further introduced to realize a low resistance contact to the top n-AlGaN layer. This led to the demonstration of a low tunnel junction resistance of 1.9 × 10−3 Ω cm2 obtained at 1 kA/cm2. Light emission at 287 nm with an on-wafer peak external quantum efficiency of 2.8% and a wall-plug efficiency of 1.1% was achieved. The measured power density at 1 kA/cm2 was 54.4 W/cm2, confirming the efficient hole injection through interband tunneling. With the benefits of the minimized internal absorption and efficient hole injection, a tunnel-injected UV LED structure could enable future high efficiency UV emitters.

Document Details

Document Type
Pub Defense Publication
Publication Date
Feb 12, 2018
Source ID
10.1063/1.5017045

Entities

People

  • Andrew A. Allerman
  • Andrew Armstrong
  • Fatih Akyol
  • Gabriel Calderon
  • Jared Johnson
  • Jinwoo Hwang
  • Michael W. Moseley
  • Sanyam Bajaj
  • Siddharth Rajan
  • Yuewei Zhang
  • Zane Jamal-eddine

Organizations

  • Air Force Office of Scientific Research
  • National Science Foundation
  • Office of Naval Research
  • Ohio State University
  • Sandia National Laboratories

Tags

Fields of Study

  • Materials science

Readers

  • Pulsed Power and Plasma Physics.
  • Semiconductor Device Technology

Technology Areas

  • Quantum Computing