Elastic mismatch induced reduction of the thermal conductivity of silicon with aluminum nano-inclusions

Abstract

We use aluminum nano-inclusions in silicon to demonstrate the dominance of elastic modulus mismatch induced scattering in phonon transport. We use time domain thermoreflectance to measure the thermal conductivity of thin films of silicon co-deposited with aluminum via molecular beam epitaxy resulting in a Si film with 10% clustered Al inclusions with nanoscale dimensions and a reduction in thermal conductivity of over an order of magnitude. We compare these results with well-known models in order to demonstrate that the reduction in the thermal transport is driven by elastic mismatch effects induced by aluminum in the system.

Document Details

Document Type
Pub Defense Publication
Publication Date
May 21, 2018
Source ID
10.1063/1.5019269

Entities

People

  • Ashutosh Giri
  • Brian F. Donovan
  • Jerrold A. Floro
  • Long Chen
  • Patrick E Hopkins
  • S. J. Poon
  • Wade A. Jensen

Organizations

  • Air Force Office of Scientific Research
  • Office of Naval Research Global
  • United States Naval Academy
  • University of Virginia

Tags

Fields of Study

  • Physics

Readers

  • Materials Science and Engineering.
  • Mechanical Engineering/Mechanics of Materials.
  • Thin Film Deposition Science.