Low damage electrical modification of 4H-SiC via ultrafast laser irradiation
Abstract
The electrical properties of 4H-SiC under ultrafast laser irradiation in the low fluence regime (<0.50 J/cm2) are presented. The appearance of high spatial frequency laser induced periodic surface structures is observed at a fluence near 0.25 J/cm2 and above, with variability in environments like in air, nitrogen, and a vacuum. In addition to the formation of periodic surface structures, ultrafast laser irradiation results in possible surface oxidation and amorphization of the material. Lateral conductance exhibits orders of magnitude increase, which is attributed to either surface conduction or modification of electrical contact properties, depending on the initial material conductivity. Schottky barrier formation on ultrafast laser irradiated 4H-SiC shows an increase in the barrier height, an increase in the ideality factor, and sub-bandgap photovoltaic responses, suggesting the formation of photo-active point defects. The results suggest that the ultrafast laser irradiation technique provides a means of engineering spatially localized structural and electronic modification of wide bandgap materials such as 4H-SiC with relatively low surface damage via low temperature processing.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Apr 11, 2018
- Source ID
- 10.1063/1.5020445
Entities
People
- Ben Torralva
- Jamie D Phillips
- Joseph Wendorf
- Minhyung Ahn
- Rico S. Cahyadi
- Steven Yalisove
- Willie Bowen
Organizations
- Air Force Office of Scientific Research
- Dow Corning
- Lloyd's Register Foundation
- University of Michigan