Analytical and numerical simulation of electron beam induced current profiles in p-n junctions

Abstract

The electron beam induced current (EBIC) mode of a scanning electron microscope (SEM) is a widely used technique for the quantitative assessment of minority carrier diffusion length and surface recombination. Point source (one-dimensional) and extended source (two-dimensional) analytical models are two widely used approaches to assess this information in geometry where the electron beam (e-beam) is parallel to the p-n junction. In this article, a two-dimensional (2D) analytical model is evaluated and compared with 2D finite element numerical simulations, where the electron beam-solid interaction is modeled using a Monte Carlo simulation coupled with a drift-diffusion solver. The simulations are computed for both low and high level injection conditions. The effect of an e-beam injection level on the shape of EBIC profiles is analyzed to evaluate limitations of the analytical models.

Document Details

Document Type
Pub Defense Publication
Publication Date
Sep 17, 2018
Source ID
10.1063/1.5049117

Entities

People

  • Chaffra A. Affouda
  • James E. Moore
  • Phillip R. Jenkins
  • Sergey I Maximenko

Organizations

  • George Washington University
  • Office of Naval Research
  • United States Naval Research Laboratory

Tags

Fields of Study

  • Physics

Readers

  • Computational Modeling and Simulation
  • Pulsed Power and Plasma Physics.
  • Semiconductor Device Technology

Technology Areas

  • Directed Energy
  • Microelectronics