Atomic layer deposition of titanium nitride for quantum circuits
Abstract
Superconducting thin films with high intrinsic kinetic inductance are of great importance for photon detectors, achieving strong coupling in hybrid systems, and protected qubits. We report on the performance of titanium nitride resonators, patterned on thin films (9–110 nm) grown by atomic layer deposition, with sheet inductances of up to 234 pH/□. For films thicker than 14 nm, quality factors measured in the quantum regime range from 0.2 to 1.0 × 106 and are likely limited by dielectric two-level systems. Additionally, we show characteristic impedances up to 28 kΩ, with no significant degradation of the internal quality factor as the impedance increases. These high impedances correspond to an increased single photon coupling strength of 24 times compared to a 50 Ω resonator, transformative for hybrid quantum systems and quantum sensing.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Nov 19, 2018
- Source ID
- 10.1063/1.5053461
Entities
People
- Abigail Shearrow
- David Awschalom
- David I. Schuster
- E. Shirokoff
- F Joseph Heremans
- Gerwin Koolstra
- Nathan Earnest
- Peter S. Barry
- Samuel J Whiteley
Organizations
- Argonne National Laboratory
- Army Research Office
- National Science Foundation
- United States Department of Energy
- University of Chicago