EuO epitaxy by oxygen scavenging on SrTiO3 (001): Effect of SrTiO3 thickness and temperature

Abstract

The EuO/SrTiO3 heterojunction is a promising combination of a ferromagnetic material and a two-dimensional electron system. We explore the deposition of Eu metal on SrTiO3/Si pseudo-substrates, with varying SrTiO3 (STO) thickness, under ultrahigh vacuum conditions. By varying the thickness of the STO layer (2-10 nm) and the deposition temperature (20-300 °C), we investigate the process by which oxygen is scavenged from STO by Eu. In situ x-ray photoelectron spectroscopy is used to investigate the electronic structure of the nominal Eu/STO/Si stack. We find that as a result of Eu deposition, epitaxial EuO is formed on thick STO (6-10 nm), leaving behind a highly oxygen-deficient SrTiO3-δ layer of ∼4 nm in thickness. However, if the thickness of the STO layer is comparable to or less than the scavenging depth, the crystal structure of STO is disrupted and a solid state reaction between Eu, Si, and STO occurs when the deposition is done at a high temperature (300 °C). On the other hand, at a low temperature (20 °C), only a 1-2 nm-thick EuO interlayer is grown, on top of which the Eu metal appears to be stable. This study elucidates the growth process under different conditions and provides a better understanding and control of this system.

Document Details

Document Type
Pub Defense Publication
Publication Date
Dec 17, 2018
Source ID
10.1063/1.5059560

Entities

People

  • Agham Posadas
  • Alexander A Demkov
  • David J Smith
  • Sirong Lu
  • Wei Guo

Organizations

  • Air Force Office of Scientific Research
  • Arizona State University
  • National Science Foundation Directorate for Mathematical & Physical Sciences
  • University of Texas at Austin

Tags

Fields of Study

  • Materials science

Readers

  • Materials Science and Engineering.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene