Maskless laser nano-lithography of glass through sequential activation of multi-threshold ablation
Abstract
Controllable nanofabrication is at the very foundation of nano-science and nano-technology. Today, ultrafast laser writing has been broadly adopted for micro-fabrication because of its ability to make precise and rapid processing of almost all types of materials in an ambient environment. However, direct laser writing is typically unsuitable for high-quality 2D nano-patterning. In this work, we introduce a maskless laser nano-lithographic technique that allows us to create regular 2D periodic nanopatterns on glass. Glass is a particularly challenging material since it does not absorb light readily. Our strategy starts with a glass sample being coated with a thin layer of metal, and then irradiated with a series of pulse bursts at progressively increasing fluence levels. This process allows us to sequentially activate a series of tailored physical processes that lead to the formation of regular 2D periodic nanopatterns on glass. The formation mechanism of this nano-patterning is also simulated numerically and further corroborated by a series of control experiments. We also show controllability in forming various shapes and sizes of nanopatterns through tailored fluence doses. Our technique provides a high-speed and low-cost method for glass nanofabrication.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Apr 01, 2019
- Source ID
- 10.1063/1.5080344
Entities
People
- A. Y. Vorobyev
- Billy Lam
- Chunlei Guo
- Erik Garcell
- Jianjun Yang
- Jihua Zhang
- Subhash C Singh
- Yizhuo He
- Zhibing Zhan
Organizations
- Army Research Office
- Changchun Institute of Optics, Fine Mechanics and Physics
- Defense Advanced Research Projects Agency
- Gates Foundation
- National Science Foundation
- University of Rochester