Design of AlGaN-based quantum structures for low threshold UVC lasers

Abstract

The influence of the polarization field on the emission properties of the AlGaN-based quantum structures grown on AlN substrates was investigated as a function of well width, barrier width, and barrier height. A thin AlGaN well and a thin AlN barrier design reduced the polarization field to ∼0.5 MV/cm, resulting in an ultralow laser threshold of 3 kW/cm2 in an optically pumped configuration. These experimental results were used to validate the simulation. In the next step, a structure with Al0.7Ga0.3N barriers was designed to support carrier injection with a minimal loss in optical performance. This structure showed a threshold of 7 kW/cm2 under optical pumping and an estimated threshold current of 8 kA/cm2 for the electric injection.

Document Details

Document Type
Pub Defense Publication
Publication Date
Dec 09, 2019
Source ID
10.1063/1.5125256

Entities

People

  • Andrew Klump
  • Baxter Moody
  • James Tweedie
  • Pramod Reddy
  • Qiang Guo
  • Ramón Collazo
  • Ronny Kirste
  • Seiji Mita
  • Shun Washiyama
  • Yan Guan
  • Zlatko Sitar

Organizations

  • Air Force Office of Scientific Research
  • Army Research Office
  • National Science Foundation
  • North Carolina State University

Tags

Fields of Study

  • Materials science
  • Physics

Readers

  • Pulsed Power and Plasma Physics.
  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.
  • Semiconductor Device Technology

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Quantum Computing