Thermal rate constants for electron attachment to N2O: An example of endothermic attachment

Abstract

Rate constants for dissociative electron attachment to N2O yielding O− have been measured as a function of temperature from 400 K to 1000 K. Detailed modeling of kinetics was needed to derive the rate constants at temperatures of 700 K and higher. In the 400 K–600 K range, upper limits are given. The data from 700 K to 1000 K follow the Arrhenius equation behavior described by 2.4 × 10−8 e−0.288 eV/kT cm3 s−1. The activation energy derived from the Arrhenius plot is equal to the endothermicity of the reaction. However, calculations at the CCSD(T)/complete basis set level suggest that the lowest energy crossing between the neutral and anion surfaces lies 0.6 eV above the N2O equilibrium geometry and 0.3 eV above the endothermicity of the dissociative attachment. Kinetic modeling under this assumption is in modest agreement with the experimental data. The data are best explained by attachment occurring below the lowest energy crossing of the neutral and valence anion surfaces via vibrational Feshbach resonances.

Document Details

Document Type
Pub Defense Publication
Publication Date
Aug 18, 2020
Source ID
10.1063/5.0016121

Entities

People

  • Albert A Viggiano
  • Brendan C Sweeny
  • Jordan C. Sawyer
  • Nicholas S Shuman
  • Shaun G Ard
  • Thomas M Miller

Organizations

  • Air Force Office of Scientific Research
  • Air Force Research Laboratory
  • Boston College
  • Nuclear Regulatory Commission

Tags

Readers

  • Materials Science and Engineering.
  • Molecular Photonics/Laser Physics

Technology Areas

  • Microelectronics