Ultra-low magnetic damping in epitaxial Li0.5Fe2.5O4 thin films

Abstract

The realization of more energy efficient nanomagnetic information devices relies on the existence of magnetic insulators capable of supporting pure spin currents in the absence of a dissipative charge current. Currently, there is a limited number of thin-film magnetic insulators with low magnetic damping. Li0.5Fe2.5O4 (LFO) is well known to possess the lowest damping among the bulk spinel structure oxides, but, thus far, LFO thin films have not lived up to these expectations. Here, we demonstrate low magnetic damping (even lower than typical bulk values) and bulk magnetization in 3 nm thick epitaxial LFO thin films. At room temperature, SQUID magnetometry shows a high saturation magnetization of 320 kA/m, and broadband ferromagnetic resonance measurements yield an effective Gilbert damping parameter of 1.3×10−3, which is among the lowest reported for ferro-/ferrimagnetic films of comparable thickness. Our results show the promise of LFO as a candidate material for spin current-based spintronics.

Document Details

Document Type
Pub Defense Publication
Publication Date
Aug 31, 2020
Source ID
10.1063/5.0023077

Entities

People

  • Jacob J. Wisser
  • Lauren J. Riddiford
  • Satoru Emori
  • Xin Yu Zheng
  • Y. Suzuki

Organizations

  • National Science Foundation
  • Stanford University
  • United States Department of Defense
  • United States Department of Energy
  • Virginia Tech

Tags

Fields of Study

  • Physics

Readers

  • Control Systems Engineering.
  • Spectroscopy.
  • Superconducting Magnet Technology

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene