Thermal management strategies for gallium oxide vertical trench-fin MOSFETs
Abstract
Trench-fin MOSFETs, with their near-surface heat generation and the higher-surface area afforded by their geometry for thermal management, represent a promising solution to the thermal problems frequently encountered in lateral β-Ga2O3 devices. Here, we investigate potential thermal-management strategies for a vertical β-Ga2O3 trench-fin MOSFET through parametric analysis, offering recommendations on how best to design a device for maximal current density and excellent thermal performance. Primarily, by using a thermally conductive dielectric over the MOSFET structure, significant improvements to device power density may be achieved, aided by thermal spreading. Additionally, we find that by bonding thermal spreaders to its topside can yield significant improvements in thermal performance.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Feb 23, 2021
- Source ID
- 10.1063/5.0033001
Entities
People
- Akhil Mauze
- Chao Yuan
- James A. Speck
- Jingjing Shi
- Robert H. Montgomery
- Samuel Graham
- Samuel Kim
- Satish Kumar
- Takeki Itoh
- Yuewei Zhang
Organizations
- Air Force Office of Scientific Research
- Georgia Tech
- University of California, Santa Barbara