In situ microscopy for plasma erosion of complex surfaces

Abstract

A novel method for the in situ visualization and profilometry of a plasma-facing surface is demonstrated using a long-distance microscope. The technique provides valuable in situ monitoring of the microscopic temporal and morphological evolution of a material surface subject to plasma–surface interactions, such as ion-induced sputter erosion. Focus variation of image stacks enables height surface profilometry, which allows a depth of field beyond the limits associated with high magnification. As a demonstration of this capability, the erosion of a volumetrically featured aluminum foam is quantified during ion-bombardment in a low-temperature argon plasma where the electron temperature is ∼7 eV and the plasma is biased relative to the target surface such that ions impinge at ∼300 eV. Three-dimensional height maps are reconstructed from the images captured with a long-distance microscope with an x–y resolution of 3 × 3 μm2 and a focus-variation resolution based on the motor step-size of 20 μm. The time-resolved height maps show a total surface recession of 730 μm and significant ligament thinning over the course of 330 min of plasma exposure. This technique can be used for developing plasma-facing components for a wide range of plasma devices for applications such as propulsion, manufacturing, hypersonics, and fusion.

Document Details

Document Type
Pub Defense Publication
Publication Date
Jul 01, 2021
Source ID
10.1063/5.0043002

Entities

People

  • Angelica Ottaviano
  • Anirudh Thuppul
  • Chris Dodson
  • Gary Li
  • John Hayes
  • Richard E. Wirz
  • Zhitong Chen

Organizations

  • UCLA Henry Samueli School of Engineering and Applied Science
  • United States Air Force
  • University of California, Los Angeles

Tags

Fields of Study

  • Physics

Readers

  • Medical Imaging.
  • Pulsed Power and Plasma Physics.
  • Thin Film Deposition Science.

Technology Areas

  • Hypersonics
  • Microelectronics
  • Microelectronics - Graphene