Strong effect of scandium source purity on chemical and electronic properties of epitaxial ScxAl1−xN/GaN heterostructures

Abstract

Epitaxial multilayer heterostructures of ScxAl1−xN/GaN with Sc contents x = 0.11–0.45 are found to exhibit significant differences in structural quality, chemical impurity levels, and electronic properties depending on the starting Sc source impurity levels. A higher purity source leads to a 2–3 orders of magnitude reduction in the carbon, oxygen, and fluorine unintentional doping densities in MBE-grown ScxAl1−xN/GaN multilayers. Electrical measurements of ScxAl1−xN/n+GaN single heterostructure barriers show a 5–7 orders of magnitude reduction in the electrical leakage for films grown with a higher purity Sc source at most Sc contents. The measured chemical and electrical properties of epitaxial ScxAl1−xN highlight the importance of the starting Sc source material purity for epitaxial device applications that need these highly piezoelectric and/or ferroelectric transition-metal nitride alloys.

Document Details

Document Type
Pub Defense Publication
Publication Date
Sep 01, 2021
Source ID
10.1063/5.0054522

Entities

People

  • Celesta S. Chang
  • David A. Muller
  • Debdeep Jena
  • Huili Grace Xing
  • Hyunjea Lee
  • Joseph Casamento
  • M.F. Besser
  • Takuya Maeda

Organizations

  • Air Force Office of Scientific Research
  • Ames National Laboratory
  • Cornell University
  • Defense Advanced Research Projects Agency
  • National Science Foundation

Tags

Fields of Study

  • Materials science

Readers

  • Semiconductor Device Technology
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene