Temperature dependence of electronic bands in Al/GaN by utilization of invariant deep defect transition energies

Abstract

We show experimentally that deep point defect levels in GaN, AlN, and AlGaN are constant with respect to the vacuum level and can be used as invariant internal energy references. This offered a convenient and quick way to assess band shifts and impurity levels as a function of temperature via photoluminescence. For AlGaN, we determined that the band shift in the temperature range of 3–600 K occurred primarily in the valence band and that the lowering of the conduction band edge was comparatively small. The valence band shift (as a fraction of the Varshni bandgap shift) in AlGaN varies from ∼70% in AlN to ∼90% in GaN.

Document Details

Document Type
Pub Defense Publication
Publication Date
Jul 12, 2021
Source ID
10.1063/5.0055409

Entities

People

  • Andrew Klump
  • Ji Hyun Kim
  • Pegah Bagheri
  • Pramod Reddy
  • Ramón Collazo
  • Ronny Kirste
  • Seiji Mita
  • Shun Washiyama
  • Zlatko Sitar

Organizations

  • Air Force Office of Scientific Research
  • Army Research Office
  • National Science Foundation
  • North Carolina State University

Tags

Fields of Study

  • Materials science

Readers

  • Calculus or Mathematical Analysis
  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.
  • Semiconductor Device Technology

Technology Areas

  • Microelectronics