On the Ge shallow-to-deep level transition in Al-rich AlGaN

Abstract

Contrary to the arsenides where donors undergo stable DX transition, we find that Ge in AlGaN does not suffer from the DX transition; instead, it undergoes a shallow donor (30 meV) to deep donor (150 meV) transition at ∼50% Al content in the alloy. This finding is of profound technological importance as it removes fundamental doping limitations in AlGaN and AlN imposed by the presumed DX−1 acceptor state. The charge state of Ge below and above the transition was determined by co-doping with Si, which remains a shallow donor in AlGaN for up to 80% Al. It was found that Ge occupied a donor state with a (0/+) thermodynamic transition for AlGaN alloys below and above the transition. Ge as a shallow donor was completely ionized at room temperature; however, the ionization of the deep donor required elevated temperatures, commensurate with its higher ionization energy. This behavior is not unique to Ge; preliminary findings show that Si and O in AlGaN may behave similarly.

Document Details

Document Type
Pub Defense Publication
Publication Date
Aug 03, 2021
Source ID
10.1063/5.0059037

Entities

People

  • Andrew Klump
  • Dennis Szymanski
  • Dolar Khachariya
  • Ji Hyun Kim
  • Pegah Bagheri
  • Pramod Reddy
  • Ramón Collazo
  • Ronny Kirste
  • Seiji Mita
  • Spyridon Pavlidis
  • Yan Guan
  • Zlatko Sitar

Organizations

  • Air Force Office of Scientific Research
  • Army Research Office
  • National Science Foundation
  • North Carolina State University

Tags

Fields of Study

  • Materials science

Readers

  • Semiconductor Device Technology
  • Theoretical Analysis.