Molybdenum carbonitride deposited by plasma atomic layer deposition as a Schottky contact to gallium nitride
Abstract
Molybdenum carbonitride films prepared by plasma enhanced atomic layer deposition were studied for use as Schottky contacts to n-type gallium nitride. Deposited using bis(tertbutylimino)bis(dimethylamino)molybdenum and a remote plasma N2/H2 plasma, the diodes capped with Ti/Au displayed excellent rectifying behavior with a barrier height of 0.87 ± 0.01 eV and an ideality factor of 1.02 ± 0.01 after annealing at 600 °C in N2. These characteristics surpass those of pure metal nitride Schottky diodes, possibly due to work function engineering due to the incorporation of C and use of a remote plasma to avoid process-induced defects. According to x-ray photoelectron spectroscopy and energy-dispersive x-ray spectroscopy, the film composition is approximately MoC0.3N0.7. Grazing incidence x-ray diffraction and plan-view transmission electron microscopy selected area electron diffraction are consistent with a rock salt structure with a lattice parameter of 0.42 nm.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Sep 06, 2021
- Source ID
- 10.1063/5.0062140
Entities
People
- Alex Molina
- Ama D. Agyapong
- Ian E. Campbell
- Suzanne E Mohney
- Timothy N. Walter
Organizations
- Office of Naval Research
- Pennsylvania State University