Perpendicular magnetic tunnel junctions with multi-interface free layer
Abstract
Future generations of magnetic random access memory demand magnetic tunnel junctions that can provide simultaneously high magnetoresistance, strong retention, low switching energy, and small cell size below 10 nm. Here, we study perpendicular magnetic tunnel junctions with composite free layers, where multiple ferromagnet/nonmagnet interfaces can contribute to the thermal stability. Different nonmagnetic materials (MgO, Ta, and Mo) have been employed as the coupling layers in these multi-interface free layers. The evolution of junction properties under different annealing conditions is investigated. A strong dependence of the tunneling magnetoresistance on the thickness of the first CoFeB layer has been observed. In junctions where Mo and MgO are used as coupling layers, a large tunneling magnetoresistance above 200% has been achieved after 400 °C annealing.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Dec 13, 2021
- Source ID
- 10.1063/5.0066782
Entities
People
- Adam Laurie
- Albert V Davydov
- Ali Habiboglu
- Bowei Zhou
- Daniel B Gopman
- Jian-Ping Wang
- Jonah Saidian
- Magda Andrade
- Pravin Khanal
- Weigang Wang
- Yanliu Dang
Organizations
- Defense Advanced Research Projects Agency
- National Institute of Standards and Technology
- National Science Foundation
- Purdue University
- Semiconductor Research Corporation
- University of Arizona
- University of Minnesota