Demonstration of DC Kerr effect induced high nonlinear susceptibility in silicon rich amorphous silicon carbide

Abstract

In this study, we demonstrate the DC Kerr effect in plasma-enhanced chemical vapor deposition silicon rich amorphous silicon carbide (a-SiC). Using the resonance shift of the transmission spectra of a ring resonator, we experimentally extract the third order nonlinear susceptibility χ3 to be 6.90×10−19 m2/V2, which is estimated to be more than six times higher than previous reported values in stoichiometric a-SiC. The corresponding induced second order nonlinear susceptibility χ2 of 44.9 pm/V is also three times higher than the reported value in silicon and silicon rich nitride utilizing the DC Kerr effect. The high nonlinearity makes silicon rich a-SiC a good materials candidate for nonlinear photonic applications.

Document Details

Document Type
Pub Defense Publication
Publication Date
Feb 14, 2022
Source ID
10.1063/5.0075852

Entities

People

  • Hani Nejadriahi
  • Li-Yang Sunny Chang
  • Paul K. L. Yu
  • Steve Pappert

Organizations

  • Office of Naval Research
  • University of California

Tags

Readers

  • Combustion science or combustion engineering.
  • Integrated Circuit Design and Technology.
  • Materials Science and Engineering.

Technology Areas

  • Quantum Science - Quantum Dots