GaN lateral polar junction arrays with 3D control of doping by supersaturation modulated growth: A path toward III-nitride superjunctions

Abstract

We demonstrate a pathway employing crystal polarity controlled asymmetric impurity incorporation in the wide bandgap nitride material system to enable 3D doping control during the crystal growth process. The pathway involves polarity specific supersaturation modulated growth of lateral polar structures of alternating Ga- and N-polar GaN domains. A STEM technique of integrated differential phase contrast is used to image the atomic structure of the different polar domains and their single atomic plane boundaries. As a demonstration, 1 μm wide alternating Ga- and N-polar GaN domains exhibiting charge balanced and periodic domains for superjunction technology were grown. The challenges in characterizing the resulting 3D doping profile were addressed with atom probe tomography with atomic scale compositional resolution corroborating capacitance measurements and secondary-ion mass spectroscopy analysis.

Document Details

Document Type
Pub Defense Publication
Publication Date
Jan 03, 2022
Source ID
10.1063/5.0076044

Entities

People

  • A. S. Chang
  • Dennis Szymanski
  • Dolar Khachariya
  • Erhard Kohn
  • Lincoln J Lauhon
  • Pegah Bagheri
  • Pramod Reddy
  • Ramón Collazo
  • Ronny Kirste
  • Shun Washiyama
  • Spyridon Pavlidis
  • Tim B. Eldred
  • Zlatko Sitar

Organizations

  • National Science Foundation
  • North Carolina State University
  • Northwestern University
  • United States Army Research Laboratory

Tags

Fields of Study

  • Materials science

Readers

  • Semiconductor Device Technology
  • Systems Analysis and Design
  • Thin Film Deposition Science.